Surface Reactions Induced by Gas Cluster Ion Beams and Application for Atomic Layer Etching
نویسندگان
چکیده
منابع مشابه
Atomic-layer soft plasma etching of MoS2
Transition from multi-layer to monolayer and sub-monolayer thickness leads to the many exotic properties and distinctive applications of two-dimensional (2D) MoS2. This transition requires atomic-layer-precision thinning of bulk MoS2 without damaging the remaining layers, which presently remains elusive. Here we report a soft, selective and high-throughput atomic-layer-precision etching of MoS2...
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ژورنال
عنوان ژورنال: Vacuum and Surface Science
سال: 2020
ISSN: 2433-5835,2433-5843
DOI: 10.1380/vss.63.623